Magnetron Sputtering

Magnetron sputtering is a manufacturing process for depositing thin films onto substrates that has a variety of commercial and scientific applications. Researchers and design engineers looking to improve deposition rates and coverage can use software to simulate the magnetron sputtering process and determine optimal process conditions. VSim uses both FDTD and PIC algorithms to model magnetron sputtering which provides users detailed information on erosion and deposition profiles in order to improve process performance.

Magnetron-Sputtering-1
Four frames of a VSim magnetron sputtering simulation projected onto the simulation geometry
Magnetron-Sputtering-2
As a PIC code, VSim is capable of self-consistent charged particle simulations with electrostatic, ionization and particle interactions, which are critical for a successful simulation of magnetron sputtering. VSim’s well scaled parallel computation capability provides realistic sputtering results while carrying simulations out to ion crossing time scales.

Ready to evaluate VSim?